濺鍍靶材,Sputtering Targets

提供行業:裝飾鍍膜,工具鍍膜,機殼鍍膜, 燃料電池液晶面板,觸控面板,太陽能電池矽晶圓背面金屬化,半導體前後段製程發光二極體,有機發光二極體, 電阻元件靶材

提供學術及研發單位研究開發靶材
材質依英文字母序分為:

G/H
Gadolinium (Gd) Sputtering Targets	Germanium (Ge) Sputtering Targets	Gold (Au) Sputtering Targets
Hafnium (Hf) Sputtering Targets	Hafnium Carbide (HfC) Sputtering Targets	Hafnium Nitride (HfN) Sputtering Targets
Hafnium Oxide (HfO2) Sputtering Targets	Holmium (Ho) Sputtering Targets
I

Indium (In) Sputtering Targets	Indium Oxide (In2O3) Sputtering Targets	Iridium (Ir) Sputtering Targets
Iron (Fe) Sputtering Targets	Iron Oxide (Fe2O3) Sputtering Targets
L
Lanthanum (La) Sputtering Targets	Lanthanum Hexaboride (LaB6) Sputtering Targets	Lead (Pb) Sputtering Targets
Lead Telluride (PbTe) Sputtering Targets	Lead Titanate (PbTiO3) Sputtering Targets	Lithium Niobate (LiNbO3) Sputtering Targets

第◊ AB◊ CDE◊ GHIL ◊ MNP ◊ RST ◊ WVYZ ◊ 頁