濺鍍靶材,Sputtering Targets
濺鍍靶材 Sputtering Targets 液晶面板 觸控面板
液晶面板:主要分為3段(1) Array製程:主要是在玻璃基板上製作薄膜電晶體 (TFT, Thin Film Transitor). (2)Cell 製程:Array 與彩色濾光片(Color Filter)結合.
(3)Module模組製程.Array製程及彩色濾光片大部可以薄膜製程完成,使用的材料:氧化銦錫ITO靶 , 鉻Cr 靶 , 鉬Mo靶, 鋁Al靶, 鈮Nb靶, 氧化鈮Nb2O5靶, 矽Si靶, 石英SiO2靶 控面板觸(Touch Panel)
分為電阻式及電容式.構造為:(1)基材: ITO 玻璃(2) ITO PET Film (3)阻隔材(4)導電膠. 薄膜製程使用的靶材: 氧化銦錫ITO靶 , 鉻Cr 靶 , 鉬Mo靶, 鋁Al靶, 鈮Nb靶, 氧化鈮Nb2O5靶, 矽Si靶,
石英SiO2靶.
Ti, Zr, Cr, Graphite/C, TiAl, TiSi,CrSi, CrAl,
TiCr, AlTiSi, AlCrSi
Al, Cu, Cr, Sus304, In, Sn, InSn,W/Cr, W Heater
ZrO2/Y2O3, YSZ),NiO/YSZ,LaSrMnO3-LSM, LaNiO3.
CeO2/Gd2O3, Ba2In2O5, La(Sr, Mg)GaO3
AlCu, AlSiCu, AlSi,Ti , Cu, Ta, Co , Al, Cu, Cr, Ti, NiV, WTi
Ti, Ni, Ag , AuSn,
Si/SiAl, Zn, Sn, ZnAl, ZnSn, ZnSnSb, Ti/TiO2, Al, AlSi, Cr, Nb, Nb2O5 SiAl, Si, TiO2
ITO, SnO2, Cu, Cr, ITO, ZnO, AZO,Mo,CuInGa, CuInSe,InGaSe, CuSe,CuGa, CuIn, InSe, Cu, In, Ga, InGaZnO4,SrCu2O2, CuAlO2, CuCrO2SiAl, Si
Al, Ti, Ni, Ag, Au, ITO (95/5), AuGe, AuBe, AuAs, AuZn SiO2, ITO Tablet, Al Wire, IZO, ATO, AZO, MgAg, Au, LiF, CaO, In, ITO, IZO
NiCrSi,NiCrAl, CrSi, NiCrAlSi, TiCrAlSi, Cu,Ti, WTi, Ta, SiO2,CuNi, CuTi, CuSn, CuMnSn, NiTiSi,NiTiSn, CuMnNiSi, CuMnNiSn
│High Purity Materials 高純度材料│
│Special Metals Alloys 特殊金屬合金 │
│ Powder / Nano Materials 粉末及奈米材料│
│Special Ceramic Materials 特殊陶瓷材料│