濺鍍靶材,Sputtering Targets

提供行業:裝飾鍍膜,工具鍍膜,機殼鍍膜, 燃料電池液晶面板,觸控面板,太陽能電池矽晶圓背面金屬化,半導體前後段製程發光二極體,有機發光二極體, 電阻元件靶材

提供學術及研發單位研究開發靶材
材質依英文字母序分為:

Tungsten W
Tungsten (W) Sputtering Targets	Tungsten Carbide (WC) Sputtering Targets	Tungsten Disilicide (WSi2) Sputtering Targets
Tungsten Oxide (WO3) Sputtering Targets	Tungsten Disulfide (WS2) Sputtering Targets
V
Vanadium (V) Sputtering Targets	Vanadium Carbide (VC) Sputtering Targets	Vanadium Oxide (V2O5) Sputtering Targets
Y
Ytterbium (Yb) Sputtering Targets	Ytterbium Oxide (Yb2O3) Sputtering Targets
Yttrium (Y) Sputtering Targets	Yttrium Oxide (Y2O3) Sputtering Targets
Z
Zinc (Zn) Sputtering Targets	Zinc Oxide (ZnO) Sputtering Targets	Zinc Selenide (ZnSe) Sputtering Targets
Zinc Sulfide (ZnS) Sputtering Targets	Zinc Telluride (ZnTe) Sputtering Targets
Zirconium Carbide (ZrC) Sputtering Targets	Zirconium (Zr) Sputtering Targets	Zirconium Nitride (ZrN) Sputtering Targets

第◊ AB◊ CDE◊ GHIL ◊ MNP ◊ RST ◊ WVYZ ◊ 頁