蒸鍍材料 Evaporation Materials 鍍膜用單晶基板

常備之鍍膜用單晶基板:
Si Wafer / Solar Cell/Si Thermal Oxides Wafer,Si SOI (Silicon On Insulation)Wafer,Glass-:ITO Coated/ Corning E2000/ XG Glass/ Schott D263T/ Pyrex/ BK7. GaAs, Sapphire(S/C Al2O3), AlN, Al2O3, GaSb/Sapphire (Al2O3)/Ge/SiC/ZnO/MgO/LiNbO3/LiTaO3. GaP/InP/GaSb/InSb/InAs/ Quartz (SiO2)/AlN/NaCl/ MgF2/ CaF2, LaAlO3/SrTiO3/MgO/Sapphire/MgO/BatiO3/Y2O3-ZrO2

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學術及研發單位研究開發蒸鍍顆粒

材質依英文字母序分為:

矽晶圓背面金屬化

Ti, Ni, Ag , AuSn, AuZn

發光二極體 機發光二極體

Al, Ti, Ni, Ag, Au, ITO (95/5), AuGe, AuBe, AuAs, AuZn, AuSn, SiO2,ITO Tablet, Al Wire, IZO

鍍膜用單晶基板

Si Wafer / Glass/ GaP/ Sapphire, GaP/ InP/ GaSb/ InSb/ InAs/ AlN/ MgF2/ CaF2 

蒸鍍材料-純元素:

貴金屬: Au, Ag, Pt, Ir, Pd...高純金屬: In, Ta, Sn, Cu, Al...

蒸鍍材料-合金:

TiW, TiAl, NiTa, NiV, NiCr, NiTi, InSn, Pt/Ir, Au/Ag, PbSn, CrSi, AgSn

蒸鍍材料-化合物:

Oxides, Nitrides, Sulfides, Fluorides, Carbides, Borides

│High Purity Materials 高純度材料│